Zeiss expands German site that caps ASML's EUV scanner output
ZeissASMLsemiconductorEUV scannersproduction facilityGermanysemiconductor industry.
Author: 01-_-
Date: 7/27/2026
Article Summary:
Zeiss expands its production facility in Germany, adding 25,000 square meters of production and production-adjacent space, to meet the demand for ASML's Low-NA EUV scanners.